厦门大学平台管理系统李煦--中文主页-- Improvement of Interfacial Properties of 4H-SiC/SiO2by Nitrogen Plasma Treatment

李煦

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Improvement of Interfacial Properties of 4H-SiC/SiO2by Nitrogen Plasma Treatment

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发表刊物：2021 18th China International Forum on Solid State Lighting and 2021 7th International Forum on Wide Bandgap Semiconductors, SSLChina: IFWS 2021

合写作者：李煦

论文类型：Conference article (CA)

页面范围：13-16

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