厦门大学平台管理系统肖理业--中文主页-- A Novel Optical Proximity Correction (OPC) System Based on Deep Learning Method for the Extreme Ultraviolet (EUV) Lithography

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A Novel Optical Proximity Correction (OPC) System Based on Deep Learning Method for the Extreme Ultraviolet (EUV) Lithography

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发表刊物：Progress in Electromagnetics Research

第一作者：肖理业

论文类型：Journal article (JA)

卷号：176

页面范围：95-108

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