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Surface Ramam spectrpscopy for in situ investigating silicon etching process
Release time:2022-03-11 Hits:
Journal:
Spectroscopy and Spectral Analysis
Co-author:
RB
Indexed by:
Article
Volume:
20
Issue:
6
Page Number:
833-835
Translation or Not:
no
Date of Publication:
1999-11-02
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Enhanced-Raman scattering from silicon nanoparticle substrates
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Influence of annealing ambience on the formation of cobalt silicides